Dowon Kim

1PUBLICATIONS
1CO-AUTHORS
Nanofabrication, growth and self assembly
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Publications (1)

|Jan 23, 2025
Etchant-Free Dry-Developable Extreme Ultraviolet Photoresist Materials Utilizing N-Heterocyclic Carbene-Metal Complexes.

Dowon Kim, Jinhwan Byeon, Jaeboong Ahn

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Frequent Collaborators

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Sukwon Hong