Pengzhong Chen

5PUBLICATIONS
4CO-AUTHORS
Polymers and plasticsNonlinear optics and spectroscopyNanophotonicsChemical and thermal processes in energy and combustionNanoelectronics
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Publications (5)

|Jul 25, 2026
Fluorinated copolymer resists for high-resolution negative-tone lithography: Preparation and patterning performance.

|Jul 25, 2026
Polarity-engineered Sn-Ti cluster photoresists for sub-10-nm high-resolution lithography.

|Jul 23, 2026
Atomically Precise Ti-Zr Heterometallic Oxo Clusters for High-Sensitivity and High-Resolution Single-Component Extreme Ultraviolet Photoresists.

|Jul 01, 2026
A novel sulfur-containing photoinitiator based on benzophenone derivatives for rapid photopolymerization.

|Jun 15, 2026
Electron-Induced C─F Bond Activation in Sn6-oxo Cluster Resist for Enhanced Sensitivity and Sub-10-nm Patterning.

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Frequent Collaborators

5 joint publications

Xiaojun Peng

4 joint publications

Jiangli Fan

1 joint publications

Jianjun Du

1 joint publications

Huie Zhu