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Douglas R Hartline, Sascha T Löffler, Dominik Fehn+5
Sascha T Löffler
Joseph M Kasper
Frank W Heinemann
Ping Yang
Enrique R Batista
Karsten Meyer
U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
Published on : Feb 21, 2019