Rongbo Zhao
5PUBLICATIONS
3CO-AUTHORS

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Publications (5)
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|Aug 19, 2024
Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography.Rongbo Zhao, Yayi Wei, Xiaolin Wang
|Apr 16, 2024
Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole Layer.Rongbo Zhao, Xiaolin Wang, Yayi Wei
|Feb 08, 2024
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning.Rongbo Zhao, Xiaolin Wang, Hong Xu
|Aug 25, 2023
Critical dimension prediction of metal oxide nanoparticle photoresists for electron beam lithography using a recurrent neural network.Rongbo Zhao, Xiaolin Wang, Ziyu Hu
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