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Arthur M Rebello, Lucas M Ruela, Gustavo Moreto+5
Arthur M Rebello
Lucas M Ruela
Gustavo Moreto
Naiara Y Klein
Eldues Martins
Ivan S Oliveira
João P Sinnecker
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on : Sep 14, 2018