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Dominik Metzler

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Chemical and thermal processes in energy and combustion

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|Feb 10, 2017

Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C<sub>4</sub>F<sub>8</sub> and Ar/CHF<sub>3</sub> plasma.

Dominik Metzler, Chen Li, Sebastian Engelmann

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