Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

A Hemeryck

1PUBLICATIONS

0CO-AUTHORS

Reaction kinetics and dynamics

Featured researcher

Get your video featured.

Publish with JoVE

Featured researcher

Get your video featured.

Publish with JoVE

Publications (1)

Sort by Publication Date:

|Aug 10, 2017

Strain-driven diffusion process during silicon oxidation investigated by coupling density functional theory and activation relaxation technique.

N Salles, N Richard, N Mousseau

Pageof 1

Frequent Collaborators

Frequent Collaborators

Top Related Videos

Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing

Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing

Published on : Jun 09, 2023

See more related videos

Top Related Videos

Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing

Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing

Published on : Jun 09, 2023

See more related videos