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Steven M George

1PUBLICATIONS
0CO-AUTHORS
F-block chemistry
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Publications (1)

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|Feb 10, 2017
Competition between Al<sub>2</sub>O<sub>3</sub> atomic layer etching and AlF<sub>3</sub> atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluoride.

Jaime W DuMont, Steven M George

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