Akihiro Nishida

3PUBLICATIONS
2CO-AUTHORS
Elemental semiconductorsCompound semiconductorsSolid state chemistry
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Publications (3)

|Jun 01, 2026
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Cu Films Using Liquid Copper Precursor Bis(1-ethylmethylamino-2-propoxy)copper, Cu(emap)2.

|Feb 05, 2025
Atomic Layer Deposition of Hafnium-Zirconium-Oxide Films Using a Liquid Cocktail Precursor Containing Hf(dmap)4 and Zr(dmap)4 for Ferroelectric Devices.

Akihiro Nishida, Tsukasa Katayama, Takashi Endo

|Sep 14, 2023
Atomic layer deposition of Y2O3 films using a novel liquid homoleptic yttrium precursor tris(sec-butylcyclopentadienyl)yttrium [Y(sBuCp)3] and water.

Akihiro Nishida, Tsukasa Katayama, Yasutaka Matsuo

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Frequent Collaborators

2 joint publications

Yasutaka Matsuo

1 joint publications

Tsukasa Katayama