Evgeniy Manoilov
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Engineering electromagnetics
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Nanomaterials (Basel, Switzerland)
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Oct 26, 2026
Profile Study on Different Patterns in PMMA Bilayer Resist Configurations Under 20 keV Electron Beam Exposure.
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Katia Vutova
Frequent Collaborators
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joint publications
Ivan Kostic
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joint publications
Anna Bencurova
1
joint publications
Katia Vutova
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