Inversión de electrones y túneles en las interfaces térmicas de óxido de silicio para la catálisis molecular

Shi He1, Samuel R Bottum1, John C Dickenson1

  • 1Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.

Resumen

Los investigadores desarrollaron un fotoelectrodo de silicio estable utilizando una fina capa de óxido para la reducción de CO2 impulsada por el sol. Esta interfaz permite una transferencia eficiente de electrones a los catalizadores moleculares, produciendo gases de síntesis (H2 y CO) con una alta estabilidad.

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