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Generación de segundo armónico en microdispositivos de nitruro de silicio integrados con NbOI2
Ning Liu1, Qiang Liu1, Yutian Lin1
1College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nanooptoelectronic Information Materials and Devices and Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China.
Nanophotonics (Berlin, Germany)
|December 22, 2025
Resumen
Los dihaluros de óxido de niobio 2D integrados con microdispositivos de nitruro de silicio demuestran una generación de segundo armónico eficiente. Este avance permite dispositivos ópticos no lineales en chip de alto rendimiento que utilizan láseres de baja potencia.
Área de la Ciencia:
- Ciencia de materiales
- Fotónica
- Nanociencia
Sus antecedentes:
- Los dihaluros de óxido de niobio 2D exhiben propiedades ópticas no lineales de segundo orden significativas.
- La integración de estos materiales 2D con microcavidades ópticas es clave para la óptica no lineal avanzada en chip.
Objetivo del estudio:
- Demostrar la generación de segundo armónico eficiente en microcavidades integradas con dihaluros de óxido de niobio 2D.
- Desarrollar una estrategia de codiseño de materiales y fotones para fuentes de luz no lineales en chip.
Principales métodos:
- Fabricación de microdispositivos de nitruro de silicio (Si3N4) integrados con oxiyoduro de niobio (NbOI2).
- Utilización de una técnica de transferencia de van der Waals para la integración de materiales.
- Caracterización de la generación de segundo armónico bajo bombeo de láser de onda continua.
Principales resultados:
- Se logró la generación de segundo armónico con bombeo de láser de onda continua (CW) por debajo de milivatios.
- Se calculó una eficiencia de conversión del dispositivo de aproximadamente 0,024%/W.
- Se demostró la ventaja de la estructura intrínseca no centrossimétrica del NbOI2, lo que simplifica la selección de materiales.
Conclusiones:
- Se estableció un codiseño viable de materiales y fotones para fuentes de luz no lineales en chip.
- Se sentaron las bases para avanzar en chips fotónicos cuánticos y metrología en chip.
- Se destacó el potencial de los dihaluros de óxido de niobio 2D para la fotónica integrada.
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