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Potenciación del rendimiento de los transistores de película delgada de Ga2O3 mediante la pasivación de defectos para
Peng Li1, Jiajuan Shi1, Zhuangzhuang Li1
1State Key Laboratory of Integrated Optoelectronics, Key Laboratory for UV Light-Emitting Materials and Technology of Ministry of Education, School of Physics, Northeast Normal University, 5268 Renmin Street, Changchun 130024, China.
Abstract:
Ga2O3 thin-film transistors (TFTs) are resilient to high temperatures and voltages and are suitable for demanding display and sensing applications. Nevertheless, the performance of current Ga2O3 TFTs is constrained by defect-induced impediments to free carrier transport. This work introduces a strategy comprising nitrogen annealing followed by Al2O3 encapsulation via atomic layer deposition, which boosts the mobility and solar-blind UV responsivity of Ga2O3 TFTs by more than 27-fold and 94-fold, respectively. The combined results of high-resolution transmission electron microscopy characterization and computer-aided design simulation ascribe these enhancements to the effective passivation of deep-level defects at the interface, in the bulk, and on the surface of Ga2O3. Furthermore, the competition and synergy between photoconduction and gating in Ga2O3 TFTs yield a gate-voltage-programmable photoresponse, allowing for the control of both the responsivity and response time. Leveraging this, a solar-blind UV in-sensor reservoir computing system based on Ga2O3 TFTs is demonstrated, which achieves over 91.8% accuracy in fingerprint image recognition even under 40% noise. This work integrates an effective defect passivation strategy with a clarified modulation mechanism and further demonstrates its application in neuromorphic computing. The approach presented here shows a broad potential for extension to other wide-bandgap semiconductor systems.

