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Updated: Jan 7, 2026

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In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
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Semiconductor de óxido para arquitecturas de memoria avanzadas: deposición de la capa atómica, requerimiento clave y
Chi-Hoon Lee1, Seong-Hwan Ryu1, Taewon Hwang1
1Division of Materials Science and Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul, 04763, Republic of Korea.
Nano-micro letters
|January 4, 2026
Resumen
No abstract available in PubMed .
Palabras clave:
Deposición de la capa atómica (ALD)Aplicaciones de memoriaSemiconductores de óxido (OS)Más Videos Relacionados
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