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La ingeniería de la interfaz suprime el autoanillamiento en el cobre nanograno electrolizado para la unión de cobre a

Gangqiang Peng1, Xinyi Dong1,2, Binzhao Li3

  • 1Department of Systems Engineering, City University of Hong Kong, Kowloon, Hong Kong, China.

Advanced science (Weinheim, Baden-Wurttemberg, Germany)
|January 5, 2026
PubMed
Resumen

No abstract available in PubMed .

Palabras clave:
Enlaces directos de Cuembalaje electrónico avanzadoEnlace a baja temperaturaCu con nanopartículas

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