Video Experimental Relacionado
Updated: Jul 11, 2026
07:15
A Novel Method for In Situ Electromechanical Characterization of Nanoscale Specimens
Published on: June 2, 2017
9.6K
Grabado selectivo de silicio con plasma remoto para un proceso de sub-aleta sintonizable que mejora el control del
Jiayang Li1, Yuan Gao2, David Wei Zhang3
1College of Integrated Circuits, Micro-Nano Electronics, Fudan University, Shanghai 200433, China.
Nanomaterials (Basel, Switzerland)
|January 9, 2026
Resumen
Los investigadores desarrollaron una tecnología de edición de sub-aletas para FET de nanosheet. Esta innovación optimiza el perfil de la sub-aleta para mejorar la resistencia térmica y reducir la degradación, mejorando el rendimiento para aplicaciones de bajo consumo y alto rendimiento.
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