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Updated: Jun 21, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
12:05

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

層状の二酸化水酸化物に対するWO(4)(2-) の使用は,軽度な酸化性ブロミネーションと,H(2) O(2) とのブロミドアシストエポキシデーションのために使用されます

B F Sels1, D E De Vos, P A Jacobs

  • 1Centrum voor Oppervlaktechemie en Katalyse, Katholieke Universiteit Leuven, Kardinaal Mercierlaan 92, 3001 Heverlee, Belgium.

Journal of the American Chemical Society
|August 23, 2001
PubMed
まとめ

層状のダブルヒドロキシード上の新しいtungstate触媒は,過酸化水素を使用してolefinsを効率的にブロミン化します. この方法は,従来のプロセスに比べ,よりグリーンで単一鍋の代替手段であり,温和な条件下でも高い選択性を実現します.

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