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Updated: Jul 24, 2026

Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
09:15

Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects

Published on: January 4, 2016

原子酸素によるSi(100) の被動的および活性的酸化:可能な反応機構の理論的研究

Cheol Ho Choi1, Da-Jiang Liu, J W Evans

  • 1Department of Chemistry, College of Natural Sciences, Kyungpook National University, Taegu 702-701, South Korea.

Journal of the American Chemical Society
|July 18, 2002
PubMed
まとめ

この研究は,原子酸素によるシリコンの酸化中に安定した表面構造を明らかにしています. また,一貫した脱吸収バリアを持つ2つの主要なエッチングメカニズムを特定し,実験的なバリエーションを説明しています.

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