レジオレギュラーポリ (((3-ヘキシルチオフェン) とポリエチレンの結晶・結晶ブロック共ポリマーは,リング開きメタテシスのポリメリゼーションによる
Christopher P Radano1, Oren A Scherman, Natalie Stingelin-Stutzmann
1Laboratory of Macromolecular and Organic Chemistry, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.
Journal of the American Chemical Society
|September 8, 2005
まとめ
研究者らは,ポリエチレン (PE) とポリエチレン (P3-hexylthiophene) の新しい結晶ブロックコポリマー (P3HT) を合成した. これらの安定した,溶媒に耐性のある材料は,同種の最初のもので,半導体保温ポリマーに新しい道を開きます.
科学分野:
- ポリマー化学のポリマー化学について
- マテリアルサイエンス 材料科学
- オーガニック・エレクトロニクス
背景:
- ブロックコポリマーは,異なるポリマーブロックを組み合わせることで,ユニークな特性を提供します.
- レジオレギュラーポリ・3-ヘキシルチオフェン (P3HT) は,確立された半導体ポリマーです.
- ポリエチレン (PE) は,広く使用される絶縁ポリマーです.
研究 の 目的:
- P3HTとPEの新しい結晶-結晶ブロックコポリマーを合成する.
- 半導体ブロックと隔離結晶ブロックの組み合わせの可能性を探求する.
- オーガニック・エレクトロニクス・アプリケーションのための新しい材料を開発する.
主な方法:
- オレフィン末端のP3HTを用いたリング開封メタテシスポリメリゼーション (ROMP) による合成.
- サイクロオクテンの存在下でのチェーン転送ポリメリゼーション.
- ポリエチレンを産出するために,ポリオチクロオクテンブロックの水素化.
- 1H NMR,差分スキャニングカロメトリー (DSC),および広角X線散射 (WAXS) を使用した特徴付け.
主要な成果:
- 高分子量,結晶型-結晶型P3HT-PEブロック共ポリマーの合成に成功しました.
- その結果生成されるコポリマーには,優れた熱安定性があります.
- 材料は,環境条件下で溶媒に対する耐性を示す.
- 初めて報告された結晶型-結晶型半導体-絶縁ブロックコポリマー.
結論:
- 開発されたP3HT-PEブロック共ポリマーは,新しい材料のクラスを表しています.
- これらの材料は,半導体P3HTの特性と,結晶構造のPEの断熱性を組み合わせています.
- この研究は,高度なアプリケーションのための結晶ブロックコポリマーに関する将来の研究のための基礎を築きます.
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