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Updated: Jul 17, 2026

Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics
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Published on: September 28, 2016

シリルパラジウム複合体のダイナミックなプロセス:中間Si-HとSi-Siシグマ複合体の証拠

Robert C Boyle1, Douglas Pool, Heiko Jacobsen

  • 1Department of Chemistry, Tulane University, New Orleans, Louisiana 70118, USA.

Journal of the American Chemical Society
|July 13, 2006
PubMed
まとめ

ダイナミックな核磁気共振 (NMR) 研究は,シリルパラジウム複合体の温度に依存する行動を明らかにしています. これは,シグマ複合体の反応における重要な中間物質としての一時的な形成を示唆している.

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