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Updated: Jul 12, 2026

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
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ステップ・エッジに局限したフォノン: 拡張された表面欠陥における力を理解するための経路

L Niu, D J Gaspar, S J Sibener

    Science (New York, N.Y.)
    |May 12, 1995
    PubMed
    まとめ

    不弾性ヘリウム原子の散乱により,ニッケル表面上のユニークなステップ誘発フォノンが明らかになった. ステップエッジに沿ったこれらの局所的な振動は,金属結合と表面欠陥の安定性についての洞察を提供します.

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