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Updated: Jul 11, 2026

Electron Channeling Contrast Imaging for Rapid III-V Heteroepitaxial Characterization
07:50

Electron Channeling Contrast Imaging for Rapid III-V Heteroepitaxial Characterization

Published on: July 17, 2015

薄膜における脱位核化と増殖の裂け目のような源

D E Jesson, K M Chen, S J Pennycook

    Science (New York, N.Y.)
    |May 26, 1995
    PubMed
    まとめ

    緊張したエピタキシアルフィルムにおける単一のストレス濃度の近くは,自然に亀裂のような不安定性をもたらします. これらの不安定性は,変位核形成と増殖の主要な源であり,材料の強度メカニズムを明らかにします.

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