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Updated: May 26, 2026

Fabrication and Optimization of Type II Silicon Clathrate Films
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Fabrication and Optimization of Type II Silicon Clathrate Films

Published on: October 14, 2025

移行金属の調整領域における低価値シリコンフッ化物の安定化

Ramachandran Azhakar1, Rajendra S Ghadwal, Herbert W Roesky

  • 1Institut für Anorganische Chemie der Universität Göttingen, Tammannstrasse 4, 37077 Göttingen, Germany.

Journal of the American Chemical Society
|December 24, 2011
PubMed
まとめ

研究者は,シリコンを移行金属カルボニルに調整することによって,安定したシリコン (II) フッ化物化合物を合成しました. これらの新しい化合物は,構造的に特徴づけられた最初のシリコン (II) フッ化物であり,無機化学における45年間の課題を克服しました.

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