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Updated: May 24, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
12:05

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

ウラン (VI) 末端オクソ複合体の合成:反逆トランス影響によって誘発される分子幾何学

Boris Kosog1, Henry S La Pierre, Frank W Heinemann

  • 1Inorganic Chemistry, Department of Chemistry and Pharmacy, Friedrich-Alexander-University of Erlangen-Nuremberg, Egerlandstrasse 1, 91058 Erlangen, Germany.

Journal of the American Chemical Society
|February 28, 2012
PubMed
まとめ

新しいウラン (VI) オクソ複合体が合成され,特徴づけられました. リガンド改変により,トランスリガンドなしの末端ウラン (VI) オクソ複合体の安定化が可能になり,逆トランス影響の洞察を明らかにした.

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