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Updated: May 16, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Published on: February 21, 2019

酸塩の還元性裂解により,末端ウランのモノオクソ複合体を形成する

Andrew J Lewis1, Patrick J Carroll, Eric J Schelter

  • 1P. Roy and Diana T. Vagelos Laboratories, Department of Chemistry, University of Pennsylvania, 231 South 34th Street, Philadelphia, Pennsylvania 19104, United States.

Journal of the American Chemical Society
|December 11, 2012
PubMed
まとめ

ウラン化学者は,陽子駆動の方法とは異なり,窒素を活性化することによって,新しいウラン-オクソ複合体を生み出した. このユニークなN-O結合割れは,ウラン化学のための新しい経路を提供します.

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