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Updated: Mar 24, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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ウラン10組複合体における金属対金属結合

Johann A Hlina1, James R Pankhurst1, Nikolas Kaltsoyannis2,3

  • 1EaStCHEM School of Chemistry, University of Edinburgh , Joseph Black Building, The King's Buildings, Edinburgh EH9 3FJ, U.K.

Journal of the American Chemical Society
|March 5, 2016
PubMed
まとめ

新しいヘテロメタリック複合体は,ウラン10組の短い金属結合を明らかにします. DFTの計算と実験データは,U-NiがU-Pdよりも高い結合順番を示している.

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