カルシート内の硫酸塩ベースのディブロックコポリマーナノ粒子の遮断:アニオン安定剤鎖の表面密度の変動の影響
Yin Ning1, Lee A Fielding1,2, Liam P D Ratcliffe1
1Department of Chemistry, University of Sheffield , Brook Hill, Sheffield, South Yorkshire S3 7HF, U.K.
Journal of the American Chemical Society
|August 11, 2016
まとめ
ポリメリゼーション誘発セルフアセンブリ (PISA) は有機ナノ粒子を生成する. これらのナノ粒子の安定剤密度を制御すると,カルシット結晶に組み込まれ,効率的な遮断のための最適な密度を明らかにします.
科学分野:
- 材料化学
- ポリマー科学
- ナノテクノロジー
背景:
- ポリメリゼーション誘発セルフアセンブリ (PISA) は有機ナノ粒子を作るための多用途な方法である.
- ナノ粒子の表面特性を制御することは 応用に不可欠です
研究 の 目的:
- ナノ粒子安定剤の表面密度がカルシートへの遮断に及ぼす影響を調査する.
- ナノ粒子を無機結晶に組み込むための設計規則を確立する.
主な方法:
- RAFT分散ポリメリゼーションとRAFT水性乳液ポリメリゼーションを使用して,異なるPSEM安定剤表面密度を持つPSEM- PBzMAナノ粒子を合成しました.
- これらのアニオンナノ粒子のカルシート (CaCO3) モデル宿主結晶への遮断は定量化されました.
主要な成果:
- PSEM安定剤の表面密度が低いナノ粒子は,カルシットに均等な遮断を示した (最大7.5%w/w).
- 高いPSEM安定剤表面密度を持つナノ粒子は最小の遮断を示した.
- 効率的なナノ粒子遮断には最適なアニオン表面密度が必要です.
結論:
- この研究は,ナノ粒子の表面密度と遮断効率の間の反直感的な関係を示しています.
- この発見は,無機マトリックス内のナノ粒子の組み込みを制御するための新しい設計原理を提供します.
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