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Updated: Feb 5, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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強化された酸素還元反応活動のための選択C-N結合割れによる原子分散Fe-N4のエッジサイトエンジニアリング

Rui Jiang1, Li Li1, Tian Sheng2

  • 1State Key Laboratory of Chemical Resource Engineering, Beijing Advanced Innovation Center for Soft Matter Science and Engineering , Beijing University of Chemical Technology , Beijing 100029 , China.

Journal of the American Chemical Society
|September 1, 2018
PubMed
まとめ

陽気性を最適化した鉄-窒素-炭素 (Fe-N-C) 触媒は,酸素還元反応の活性を増強する. これは,Fe-N4の場所の周りの窒素結合環境を調整して,触媒性能と安定性を改善することを意味します.

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