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Updated: Jan 22, 2026

Aerosol-assisted Chemical Vapor Deposition of Metal Oxide Structures: Zinc Oxide Rods
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ダイエレクトリック基板上の均一なグラフェン単層のための一次核化主導の化学蒸気沉積成長

Huaping Wang1,2, Xudong Xue3, Qianqing Jiang1,2

  • 1Beijing National Laboratory for Molecular Sciences, CAS Research/Education Center for Excellence in Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences , Beijing 100190 , People's Republic of China.

Journal of the American Chemical Society
|July 3, 2019
PubMed
まとめ

研究者たちは 介電基板に 均一なグラフェンフィルムを 育てる新しい方法を開発しました この前駆体改変戦略は,高度な電子と光電子のグラフェン品質を向上させます.

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