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Updated: Dec 24, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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CO-Pt薄膜の酸化メカニズム

Heath Kersell1, Zahra Hooshmand2, George Yan3

  • 1Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.

Journal of the American Chemical Society
|April 14, 2020
PubMed
まとめ

コバルト酸化物膜の酸素の空白は,室温で一酸化炭素 (CO) を二酸化炭素 (CO2) にする酸化を劇的に促進します. 隙間のないフィルムは,CO2の形成が制限され,代わりに安定した炭酸塩が形成されます.

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