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Updated: Oct 4, 2025

Preparation of Hydrophobic Metal-Organic Frameworks via Plasma Enhanced Chemical Vapor Deposition of Perfluoroalkanes for the Removal of Ammonia
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Preparation of Hydrophobic Metal-Organic Frameworks via Plasma Enhanced Chemical Vapor Deposition of Perfluoroalkanes for the Removal of Ammonia

Published on: October 10, 2013

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レコードキセノン/クリプトン分離のための頑丈で放射線に耐えるホフマン型金属有機フレームワーク

Jiyan Pei1, Xiao-Wen Gu1, Cong-Cong Liang1

  • 1State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.

Journal of the American Chemical Society
|February 9, 2022
PubMed
まとめ

2つの新しいホフマン型金属有機フレームワーク (MOF) は,クセノン (Xe) の吸収とクリプトン (Kr) の分離よりも選択性を記録しています. これらの高度な吸着剤は,産業用ガス分離アプリケーションに優れた性能を提供します.

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