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Updated: Sep 10, 2025

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
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二次元材料の化学蒸気堆積過程における解読複雑性

Zhengzheng Dang1, Yide Chang1, Jixin Wu1

  • 1UM-SJTU Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China.

Physical chemistry chemical physics : PCCP
|August 26, 2025
PubMed
まとめ

原子学的シミュレーションは,2次元材料の化学蒸気堆積 (CVD) を制御するためのソリューションを提供します. このレビューは,フィルム品質と収量を改善するために,ガス相反応,吸収,拡散,核化および成長のための計算戦略を詳細に説明します.

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