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Updated: Sep 10, 2025

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
07:00

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

Published on: March 20, 2019

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特別に吸収された炭酸イオンと銅の表面再構築:時間解像度総周波数生成スペクトロシーによって明らかになった二重層の充電の効果

Jaclyn A Rebstock1, Aishwarya Rao2, Anshuman Samanta1

  • 1Department of Chemistry and Biochemistry, The Ohio State University, Columbus, Ohio 43210, United States.

Journal of the American Chemical Society
|August 27, 2025
PubMed
まとめ

特定のアニオン吸附は,CO2削減中に銅電極上のCOをブロックしません. 代わりに,銅の酸化と表面再構築はミリ秒の時間スケールで発生し,CO脱吸収とC2+の選択性に影響を与えます.

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