トレンチヘテロジュンクションダイオード統合4H-SiC LDMOS
Yanjuan Liu1, Fangfei Bai1, Junpeng Fang2
1The College of Electronic and Information Engineering, Shenyang Aerospace University, Shenyang 110136, China.
Micromachines
|August 28, 2025
まとめ
源 (THD-LDMOS) の新しい溝ヘテロジャンクションは,4H-SiC LDMOSの逆回復を促進する. このシリコンカービッド装置は,寄生ダイオード電流と電荷を大幅に減らし,他の電気特性に影響を与えることなく性能を改善します.
科学分野:
- 材料科学
- 電気工学
- 半導体物理学
背景:
- 4H-シリコンカーバイド (SiC) LDMOSデバイスは,パワーエレクトロニクスにとって不可欠です.
- LDMOS構造の寄生ダイオードは,特に逆回復時に性能を制限することができます.
- 効率的なパワースイッチングアプリケーションには,逆回復を最適化することが不可欠です.
研究 の 目的:
- 4H-SiC LDMOSの新しい構造を提案し,その源 (THD-LDMOS) でトレッチヘテロジャンクションを調査する.
- 4H-SiC LDMOSにおける寄生ダイオードの逆回復性能を向上させる.
- トレンチヘテロジャンクションが装置特性に与える影響を分析する.
主な方法:
- 装置のシミュレーションと特徴付け
- 源領域にP+ポリシリコン構造を導入する.
- ヘテロジャンクション形成とその電気的振る舞いの分析.
- THD-LDMOSと従来の4H-SiC LDMOSの比較
主要な成果:
- トレンチヘテロジャンクションは単極で,ボディのPiNダイオードと並行して動作します.
- ヘテロジュンクションは,フリーホイール操作中に最初に導電し,PiNダイオードのオンを防止します.
- リバース・リカバリー・ピーク電流 (55.5%) とリバース・リカバリー・チャージ (77.6%) を大幅に削減した.
- LDMOS装置の他の基本的な電気特性には悪影響はない.
結論:
- THD-LDMOS構造は,反復回復のパフォーマンスを効果的に改善します.
- 新しい溝ヘテロジャンクションの設計は,キャリア蓄積を減らすための実行可能な解決策を提供します.
- この進歩は,高性能の電源スイッチングアプリケーションに有益です.
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