Jove
Visualize
お問い合わせ
JoVE
x logofacebook logolinkedin logoyoutube logo
JoVEについて
概要リーダーシップブログJoVEヘルプセンター
著者向け
出版プロセス編集委員会範囲と方針査読よくある質問投稿
図書館員向け
推薦の声購読アクセスリソース図書館諮問委員会よくある質問
研究
JoVE JournalMethods CollectionsJoVE Encyclopedia of Experimentsアーカイブ
教育
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab Manual教員リソースセンター教員サイト
利用規約
プライバシーポリシー
ポリシー

関連する概念動画

MOS Capacitor01:25

MOS Capacitor

958
A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
958
MOSFET: Enhancement Mode01:22

MOSFET: Enhancement Mode

478
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
478
Characteristics of MOSFET01:17

Characteristics of MOSFET

491
Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...
491
MOSFET: Depletion Mode01:20

MOSFET: Depletion Mode

466
Depletion-mode MOSFETs represent a unique subset of MOSFET technology, functioning fundamentally differently from their enhancement-mode counterparts. Unlike enhancement MOSFETs, which require a positive gate-source voltage (Vgs) to turn on, depletion-mode MOSFETs are inherently conductive and "normally on" devices.
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
466
MOSFET01:16

MOSFET

574
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
574
Small-Signal Analysis of MOSFET Amplifiers01:23

Small-Signal Analysis of MOSFET Amplifiers

732
In small-signal analysis, a MOSFET transistor amplifier acts as a linear amplifier when operating in its saturation region. The gate-to-source voltage (VGS) of the MOSFET is the sum of the DC biasing voltage and the small time-varying input signal. This combination sets up the operating point and modulates the drain current (ID) that flows from the drain to the source. When a small AC signal is superimposed on the DC bias voltage at the gate, the instantaneous drain current comprises three...
732

こちらも読む

関連記事

共著者、ジャーナル、引用グラフによってこの研究に関連する記事。

並び替え
Same author

Quantum tunnelling and leakage current across two-dimensional materials.

Nature materials·2026
Same author

Microscopic Analysis of Degradation and Breakdown Kinetics in HfO<sub>2</sub> Gate Dielectric after Ions Irradiation.

ACS applied materials & interfaces·2025
Same author

Hardware implementation of a true random number generator integrating a hexagonal boron nitride memristor with a commercial microcontroller.

Nanoscale·2023
Same author

Memristive technologies for data storage, computation, encryption, and radio-frequency communication.

Science (New York, N.Y.)·2022
Same author

Emergence of associative learning in a neuromorphic inference network.

Journal of neural engineering·2022
Same author

Multi-Input Logic-in-Memory for Ultra-Low Power Non-Von Neumann Computing.

Micromachines·2021

関連する実験動画

Updated: Sep 9, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
09:49

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

Published on: May 13, 2020

4.1K

オプティマイズされたバルクラインナライズされたMOS偽抵抗器の設計戦略

Lorenzo Benatti1, Tommaso Zanotti1, Francesco Maria Puglisi1

  • 1Dipartimento di Ingegneria "Enzo Ferrari", Università di Modena e Reggio Emilia, Via P. Vivarelli 10/1, 41125 Modena, MO, Italy.

Micromachines
|August 28, 2025
PubMed
まとめ

この研究は,金属酸化物半導体フィールド効果トランジスタ (MOSFET) の擬似抵抗器のための最適化バイアス回路を導入し,面積,オフセット,および電力消費量を削減することによって統合回路設計を改善します.

科学分野:

  • 集積回路の設計
  • 半導体装置物理学

背景:

  • 大量線形化技術は,擬似抵抗エレメントの線形領域を拡張する.
  • 既存の方法は複雑で,面積,オフセット,電力消費に影響を及ぼします.

研究 の 目的:

  • MOSFET 擬似レジスタのための新しい,簡素化されたバイアス回路を提案する.
  • 設計の複雑さを増すことなく,面積,オフセット,および電力消費を最適化します.

主な方法:

  • 複合MOSFET構造のゲートバイアス回路の最適化に焦点を当てています.
  • 設計戦略を検証するために,レイアウト後のシミュレーションを使用します.
  • ニューラル信号の取得のためのバンドパスフィルターを設計する戦略を適用する.

主要な成果:

  • 提案されたバイアス回路は,面積,オフセット,電力消費を最適化します.
  • シミュレーションは設計戦略の有効性を確認します.
  • ハーモニック歪みとノイズ分析は,実用的な応用のためのアプローチを検証します.

結論:

  • 新しいバイアス回路設計は,MOSFET偽抵抗器の性能を効果的に向上させます.
キーワード:
大量線形化フィルタープロセスの変化偽レジスタ

さらに関連する動画

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
12:32

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors

Published on: May 24, 2020

8.8K
Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors
09:59

Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors

Published on: June 23, 2018

7.9K

関連する実験動画

Last Updated: Sep 9, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
09:49

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

Published on: May 13, 2020

4.1K
The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
12:32

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors

Published on: May 24, 2020

8.8K
Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors
09:59

Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors

Published on: June 23, 2018

7.9K
  • このアプローチは,コンパクトで効率的な統合回路設計のための実用的な解決策を提供します.
  • この戦略はニューラル信号取得フィルターなどのアプリケーションで使用するために検証されています.