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Updated: Jan 8, 2026

10:17
20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier
Published on: July 12, 2017
11.9K
高エネルギー、強場深紫外線ベースのジュールクラスアンプ、分散面冷却チップ付き
Optics letters
|December 15, 2025
まとめ
分散面冷却(DFC)技術を用いた新しい高エネルギー深紫外線(DUV)レーザーシステムが開発されました。このシステムは、室温でジュールクラスのパルスエネルギーを達成し、パルスレーザー堆積などの用途に適しています。
科学分野:
- レーザー物理学; 材料科学
背景:
- 高エネルギーパルスレーザーは、高度な材料加工に不可欠です。; 既存のシステムは、しばしば熱管理の問題に直面し、性能を制限しています。
研究 の 目的:
- 高エネルギー、強場深紫外線(DUV)パルスシステムの開発。; 改善された熱管理のための分散面冷却(DFC)技術の活用。
主な方法:
- ダイオード励起固体レーザーを使用しました。; Nd:YAGおよびサファイアを用いたDFCチップベースのサブナノ秒ジュールクラスアンプを採用しました。; 20 Hzの繰り返し率で動作し、パルスエネルギーと繰り返し率を柔軟に調整できます。
主要な成果:
- 266 nmで235 mJのパルスエネルギーを達成しました。; 480 psのサブナノ秒パルス幅を実証しました。; エキシマレーザーに匹敵する0.49 GWのピークパワーに達しました。
結論:
- DFCチップ技術により、最小限の熱影響で室温でジュールクラスのパルスエネルギーが可能になります。; 開発されたDUVレーザーシステムは、パルスレーザー堆積用途に適しています。
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