金(I)アルコキシドおよびチオラート錯体:原子層堆積前駆体としての可能性
Nicholas A Hoffman1, David J H Emslie1
1Department of Chemistry, McMaster University, 1280 Main St West, Hamilton, Ontario, L8S 4M1, Canada. emslied@mcmaster.ca.
Dalton transactions (Cambridge, England : 2003)
|December 23, 2025
まとめ
金(I)アルコキシドおよびチオラート錯体を合成し、特性評価を行った。アルコキシド錯体3は、金(ALD)の原子層堆積における潜在的用途に最適な熱安定性と揮発性を示した。
科学分野:
- 有機金属化学
- 材料科学
- 化学合成
背景:
- 金(I)錯体は、そのユニークな電子的特性と触媒および材料科学における潜在的な用途のために調査されている。
- 熱的に安定で揮発性の高い金前駆体の開発は、原子層堆積(ALD)などの技術にとって極めて重要である。
研究 の 目的:
- 新規金(I)アルコキシドおよびチオラート錯体の合成と特性評価。
- ALDにおける前駆体としてのこれらの錯体の熱安定性、揮発性、および反応性の評価。
主な方法:
- 金(I)アルコキシド錯体[(Au{OC(CF3)3}{PR3})n]の合成:AuCl(PR3)とNaOC(CF3)3および銀塩との反応による。
- 金(I)チオラート錯体[{Au(StBu)(PR3)}n]の合成:[{Au(StBu)}n]とPR3から。
- 固相構造解析、融点測定、昇華、およびHBpinおよびH3SiPhを用いた反応性研究を含む技術を用いた特性評価。
主要な成果:
- 金(I)アルコキシド錯体[(Au{OC(CF3)3}{PR3})n]を、立体障害に応じてトリマーからモノマーまでの構造的多様性を持つように合成した。
- チオラート錯体[{Au(StBu)(PR3)}n]も調製され、二量体からモノマーまでの異なる集合状態を示した。
- 錯体3(アルコキシド)は、HBpinの存在下、124℃でALDによる金の堆積を可能にする有望な熱安定性と揮発性を示したが、チオラート錯体5はそうではなかった。
結論:
- ホスフィン配位子の立体障害は、金(I)アルコキシド錯体の固相構造に大きく影響する。
- 金(I)アルコキシド錯体は、チオラート錯体と比較して、還元分解に対する反応性が速い。
- 金(I)アルコキシド錯体3は、安定性と揮発性のバランスを提供するALD用金の実行可能な前駆体である。
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