Hf/Zr超格子ベースの高κゲート誘電体とダイポール層エンジニアリングによる先進CMOS向け
Taeyoung Song1, Sanghyun Kang1,2, Yu-Hsin Kuo1
1School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.
ACS nano
|January 8, 2026
まとめ
新しいHf/Zrベースのゲートスタックは、サブナノメートル等価酸化膜厚(EOT)を達成し、マルチしきい値電圧(Vth)設計を可能にします。これらの先進的なゲート誘電体は、高温プロセスとの互換性があり、将来のロジックスケーリングのために高いデバイス信頼性を維持します。
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