n型二層MoS₂電界効果トランジスタにおけるゲート構造化による超高電流密度化
Junyoung Kwon1, Kyoung Yeon Kim2, Dongwon Jang3
1Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd, Suwon, Republic of Korea.
Nature materials
|January 9, 2026
まとめ
研究者らは、ムーアの法則の限界を克服するために、デュアルゲート二層二硫化モリブデン(MoS₂)電界効果トランジスタ(FET)を開発しました。この設計は、高いキャリア密度とシリコントランジスタに匹敵する性能を達成し、高度な論理技術への道を開きます。
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