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Updated: Feb 14, 2026

Assessment of Boron Doped Diamond Electrode Quality and Application to In Situ Modification of Local pH by Water Electrolysis
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最初の原理 シリコンの相互作用するとボロン/アルミニウム δ ドーピングされた層の帯状構造

Quinn Campbell1, Andrew Baczewski1, Shashank Misra1

  • 1Sandia National Laboratories, 1515 Eubank Blvd SE, Albuquerque, New Mexico, 87123, United States.

Journal of physics. Condensed matter : an Institute of Physics journal
|February 12, 2026
PubMed
まとめ

研究者らは,単一原子層のリンとボロン/アルミニウムでシリコンをドーピングすることで,その電子特性がどのように影響されるかを調査した. 近い距離では,ドーピングがキャンセルされ,固有のシリコンを模倣し,より大きな距離では,電子トンネリングを強化するp-nダイオード構造を形成します.

キーワード:
デルタ層 デルタ層ダイオードダイオードとは電子構造は電子構造である.シリコン・エレクトロニクス シリコン・エレクトロニクス

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