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Updated: Feb 16, 2026

Fabrication and Optimization of Type II Silicon Clathrate Films
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Fabrication and Optimization of Type II Silicon Clathrate Films

Published on: October 14, 2025

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NSGA-IIとラテンハイパーキューブサンプリングの融合により,薄膜IME成形におけるノード移動を最適化します

Hanjui Chang1,2, Fei Long3,4, Jiaquan Li3,4

  • 1Department of Mechanical Engineering, College of Engineering, Shantou University, Shantou, 515063, China. changhj@stu.edu.cn.

Scientific reports
|February 14, 2026
PubMed
まとめ

この研究は,インモールドエレクトロニクス (IME) 回路におけるノード移動を最小限に抑えることによって,消防士の安全のために磁気浮揚シールドを最適化します. 先進的なアルゴリズムは,シールドの安定性と保護機能を向上させ,シールドの位移を最大89.7%削減しました.

キーワード:
サーキットダメージによる回路損傷消防士の磁気浮揚シールドラテンハイパーキューブサンプリング (LHS)ノード検出 NSGA-II モデルプロセスパラメータ プロセスパラメータ薄膜IME技術による薄膜IME技術について

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