マイクロ・ナノ階層構造作製のためのエミッションプログラミングフェムト秒ベッセルビーム

Ultrafast laser-induced micro-nano hierarchical structures show broad applicability in optoelectronics, functional surfaces, and biomedicine. However, precisely controlling their formation through light field manipulation remains a relatively unexplored area. This work demonstrates a rapid drilling strategy on silicon using an emission-programmed, high-repetition-rate femtosecond Bessel beam. This spatiotemporal modulation enables a unique manufacturing synergy that integrates subtractive drilling and thermo-fluidic redistribution by the central lobes with additive nanostructuring by the peripheral lobes, directly fabricating a micro-nano hierarchical structure comprising tapered micro-holes, elevated micropillars, and dense nanocoatings. Meanwhile, areal scanning enables programmable geometry control through line interval adjustment. This approach offers new insights into laser-matter interactions and facilitates applications in infrared photodetection or drag-reduction surfaces.