与CeO的相互作用
K Sohlberg1, S T Pantelides, S J Pennycook
1Department of Chemistry, Drexel University, Philadelphia, PA 19104, USA.
Journal of the American Chemical Society
|July 6, 2001
概括
自发与低于665K的相互作用,在散装材料中形成基团. 这项研究澄清了的含量.
科学领域:
- 材料科学 材料科学 材料科学
- 表面化学 表面化学
- 计算化学计算化学
背景情况:
- 通过实验研究和之间的相互作用.
- 一个关键的争议是,原子是否会在表面化学吸收,还是会进入大批量.
研究的目的:
- 解决有关在体中的位置的争议.
- 为了确定在哪些条件下,的吸收是自发的.
主要方法:
- 使用了第一原则计算.
- 热力学论证与计算结果相结合.
主要成果:
- 的吸收是自发的,低于665K.
- 大量气形成基团,导致晶格膨胀.
- 预测的含量,OH频率和格子扩张的预测值与实验数据一致.
结论:
- 原子自发地进入了低于665K的体.
- 基组的形成和晶格扩张是大量体的关键指标.
- 这些发现使计算预测与实验观测相协调.
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