从超临界二氧化碳中沉积成形铜和薄膜
J M Blackburn1, D P Long, A Cabanas
1Department of Chemical Engineering, University of Massachusetts, Amherst, MA 01003, USA.
Science (New York, N.Y.)
|September 15, 2001
概括
研究人员开发了一种新的方法,使用超临界二氧化碳来沉积高质量的铜和薄膜. 这种技术使得合规涂层和纳米尺度特征的完整填充成为可能,这对于先进的微电子学至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 化学工程是化学工程的重要组成部分.
- 纳米技术 纳米技术
背景情况:
- 先进的半导体制造需要精确的导电薄膜沉积.
- 符合性涂层和高比例特征的无空隙填充是关键的挑战.
- 现有的方法往往在纳米尺度的特征统一性和效率方面扎.
研究的目的:
- 开发一种用于设备质量的铜和膜的新型沉积技术.
- 为了实现特殊的步骤覆盖和纳米特征的完整填充.
- 为了使高面比互连结构的单步制造成为可能.
主要方法:
- 使用可溶性有机金属前体沉积铜和薄膜.
- 在超临界二氧化碳溶液中利用降解.
- 使用包括平面和蚀刻,原生氧化物和金属化物在内的基板.
主要成果:
- 实现了设备质量的铜和薄膜,具有特殊的步骤覆盖.
- 证明了高比例特征 (<100 nm宽度) 的完整填充.
- 在60°C成功沉积,在250°C成功沉积铜,使其能够直接沉积在表面.
结论:
- 基于二氧化碳的超临界沉积为高级金属化提供了一个可行的途径.
- 该方法为集成电路中高面积比特征填充提供了单步解决方案.
- 这种技术对于下一代集成电路互连结构至关重要.
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