自氧化单层的有效绝缘性能使用有机二化物
Tohru Nakamura1, Satoshi Yasuda, Takayuki Miyamae
1Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5-2, 1-1 Higashi 1-Chome, Japan. tohru.nakamura@aist.go.jp
Journal of the American Chemical Society
|October 24, 2002
概括
基二甲化物在黄金表面上形成高度电阻的自氧化单层. 这些基于氧化的单层具有先进电子和成像应用的潜力.
科学领域:
- 材料科学 材料科学 材料科学
- 表面化学 表面化学
- 纳米技术 纳米技术
背景情况:
- 二甲基二甲化物通过湿沉积在Au111表面上形成自氧化单层 (AM).
- 不同于较轻的二基因化物,由于空气下的自发氧化物形成,二化物形成高度电阻的AMs.
研究的目的:
- 研究Dialkyl ditelluride衍生自氧化单层在Au上的特性和潜在应用.
- 为了突出这些单层设备制造中的氧化物物种的独特特征.
主要方法:
- 在Au(111) 表面上,dialkyl ditellurides的湿沉积.
- 在环境条件下,生成的自氧化单层的表征.
主要成果:
- 吸附导致形成高度电阻的自氧化单层.
- 氧化物种的存在得到证实,将它们与二硫化物和二化物区分开来.
- 氧化的独特特性使得选择性制造成为可能.
结论:
- 基二甲化物AMs具有高抗性和独特的氧化特征.
- 这些增材机对制造有效的电阻组件,铁电层,压电部件和新型成像系统具有前景.
- 这项研究证明了在小型设备电路中利用氧化的途径.
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