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Creating Adhesive and Soluble Gradients for Imaging Cell Migration with Fluorescence Microscopy
13:10

Creating Adhesive and Soluble Gradients for Imaging Cell Migration with Fluorescence Microscopy

Published on: April 4, 2013

在线线光刻 lithography.

Lidong Qin1, Sungho Park, Ling Huang

  • 1Department of Chemistry and Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208-3113, USA.

Science (New York, N.Y.)
|July 5, 2005
PubMed
概括

我们开发了一种高通量方法,用于在纳米线上制造纳米级结构. 这种线上光刻技术能够精确地创建磁盘阵列和间隙,用于研究电子特性.

科学领域:

  • 纳米技术 纳米技术
  • 材料科学 材料科学 材料科学
  • 电气工程 电气工程

背景情况:

  • 在一维纳米线上制造纳米结构对于先进的电子设备至关重要.
  • 现有的方法往往缺乏复杂架构所需的吞吐量或精度.

研究的目的:

  • 引入和验证一个高通量过程,以 lithographically 处理纳米线.
  • 为了使面对面的磁盘阵列和纳米线上的间隙结构能够进行常规制造.

主要方法:

  • 开发了一种新的"电线光刻"技术.
  • 组合模板导向纳米线合成,电化学沉积和湿化学蚀刻.
  • 使用浸泡笔纳米光刻法将导电聚合物沉积到制造的空隙中.

主要成果:

  • 成功制造面对面的磁盘阵列和间隙结构,尺寸从5纳米到几百纳米.
  • 研究了13纳米间隙的运输特性.
  • 研究了纳米导电聚合物对这些空隙的运输特性的影响.

结论:

  • 线上光刻为在纳米线上创建复杂的纳米结构提供了一种高通量和多功能方法.

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Published on: April 4, 2013

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
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Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

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  • 该方法促进了在精确定义的纳米尺度差距和聚合物修饰结构中研究电子运输.