,

Ruben B A Sharpe1, Dirk Burdinski, Jurriaan Huskens

  • 1MESA+ Institute for Nanotechnology, Molecular Nanofabrication, and Solid State Physics, University of Twente, 7500 AE Enschede, The Netherlands.

概括

用氧等离子体处理的黄金表面可以创建临时的蚀刻口罩. 微接触式打印减少剂局部降解屏障特性,使控制蚀刻无污染.