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Updated: Jul 5, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

用水增强的低温CO氧化和对原子氧覆盖Au的同位素效应111)

Rotimi A Ojifinni1, Nathan S Froemming, Jinlong Gong

  • 1Departments of Chemical Engineering and Chemistry, Texas Materials Institute, Center for Nano- and Molecular Science and Technology, University of Texas at Austin, 1 University Station C0400, Austin, Texas 78712-0231, USA.

Journal of the American Chemical Society
|May 1, 2008
PubMed
概括

水在黄金表面的低温一氧化碳 (CO) 氧化中起着至关重要的作用. 这项研究揭示了水分离成基,然后与二氧化碳反应形成二氧化碳,证明了水分离.

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