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Updated: Jun 23, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

应用物理. 应用物理. 两个光束挤压特征大小在光学石版画中的光学石版画.

Joseph W Perry¹

¹School of Chemistry and Biochemistry and Center for Organic Photonics and Electronics, Georgia Institute of Technology, Atlanta, GA 30332, USA. joe.perry@gatech.edu.

Science (New York, N.Y.)

|May 16, 2009

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No abstract available in PubMed .

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Published on: September 14, 2018

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