通过间歇性排放,通过谷物边界附近的辐射损伤的有效回火
Xian-Ming Bai1, Arthur F Voter, Richard G Hoagland
1Materials Science and Technology Division, MST-8, Los Alamos National Laboratory, Los Alamos, NM 87545, USA.
概括
铜的颗粒边界表现出"加载-卸载"效应,发射间位物以消灭辐射诱导的空白. 这种自我修复机制有效地修复物质损坏.
科学领域:
- 材料科学 材料科学 材料科学
- 辐射伤害 辐射伤害
- 计算材料科学科学 计算材料科学
背景情况:
- 谷物边界是已知的辐射诱导缺陷的沉点.
- 缺陷粒边界相互作用的精确原子化机制尚不清楚.
研究的目的:
- 用原子模拟来研究铜中缺陷粒边界相互作用.
- 为了阐明谷物边界背后的机制,提高了辐射耐受性.
主要方法:
- 使用了三种不同的原子模拟方法.
- 在皮秒到微秒的时间尺度上模拟互动.
- 专注于铜作为模型材料.
主要成果:
- 发现了一个
结论:
- 颗粒边界作为间隙的动态来源,促进缺陷重组.
- 这种机制为自我愈合的辐射损伤提供了较低能量的途径.
- 这些发现揭示了提高材料抗辐射的新途径.
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